Titanium complex, processes for producing the same, titanium-containing thin film, and process for producing the same
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United States of America Patent
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Jul 15, 2014
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Jun 12, 2009
filing date -
Jun 23, 2008
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Abstract
A subject for the invention is to provide novel titanium complexes which have a high vapor pressure and high thermal stability and serve as an excellent material for producing a titanium-containing thin film by a technique such as the CVD method or ALD method and to further provide processes for producing these complexes, titanium-containing thin films produced from the complexes, and a process for producing the thin films. The invention relates to producing a titanium complex represented by general formula (1):
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