Gas shower plate for plasma processing apparatus
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United States of America Patent
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Jun 24, 2014
Grant Date -
Jun 11, 2009
app pub date -
Apr 4, 2006
filing date -
Apr 5, 2005
priority date (Note) -
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Abstract
In a plasma processing apparatus for generating a plasma in a plasma generation space between a lower electrode and an upper electrode so that a processing object mounted on the lower electrode is subjected to plasma processing, a plurality of cutout portions for absorption of strain caused by thermal expansion due to rapid temperature increases in the plasma processing are formed at an equal pitch in an outer edge portion of a gas shower plate included in the upper electrode. Thus, the gas shower plate can be prevented from being damaged by occurrence of cracks in the outer edge portion of the gas shower plate or the like.
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