Precursor for formation of europium-containing thin film, and method for forming europium-containing thin film
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 10, 2014
Grant Date -
Jan 23, 2014
app pub date -
Feb 23, 2012
filing date -
Mar 29, 2011
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
Provided are a novel europium compound which has a melting point of 180° C. or lower and can be stably supplied by bubbling in a chemical vapor deposition method or an atomic layer deposition method, a precursor for forming a europium-containing thin film based on the compound, and a method for forming a europium-containing thin film using this precursor. A europium-containing thin film is formed using bis(tetramethylmonoalkylcyclopentadienyl)europium as a precursor for forming a europium-containing thin film by a chemical vapor deposition method or anatomic layer deposition method.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully