Light sensitive coating compositions useful for lithographic elements
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United States of America Patent
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Jun 3, 2014
Grant Date -
Aug 30, 2007
app pub date -
Sep 24, 2003
filing date -
Sep 24, 2003
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Abstract
A radiation sensitive composition which is primarily sensitive in the near UV and visible region of the electromagnetic spectrum is composed of a polymeric binder, an ethylenically unsaturated monomer, a radiation absorbing compound, a photoaccelerator, an onium compound, and an adhesion promoter, which are overcoated with an oxygen barrier layer. When applied to the proper support and processed, the composition is useful as an offset lithographic printing plate, color proofing film or image resist.
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