High-resolution X-ray diffraction measurement with enhanced sensitivity
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United States of America Patent
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May 20, 2014
Grant Date -
Nov 8, 2012
app pub date -
Jul 12, 2012
filing date -
Jan 7, 2010
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Abstract
A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.
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