Method and system for uniformly applying a multi-phase cleaning solution to a substrate
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United States of America Patent
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May 20, 2014
Grant Date -
Jan 16, 2014
app pub date -
Sep 18, 2013
filing date -
Jun 27, 2003
priority date (Note) -
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Abstract
A system for cleaning a substrate includes a carrier and a cleaning station. The carrier is capable of holding the substrate and is movably coupled to a pair of guide tracks extending a length of the system. The cleaning station includes a force applicator and a gate. The force applicator has an applicator length and is operatively coupled to the cleaning station. The force applicator is rotatable and is adjusted to a first height off the surface of the carrier as the substrate is being cleaned. The force applicator has a hollow structure with internal channels and openings dispersed throughout the applicator length to dispense cleaning solution to substrate surface. The gate is affixed to a trailing edge of the force applicator and is set to a second height off the surface of the carrier. The gate includes a gate length that at least spans the applicator length.
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