Gas injection device with uniform gas velocity
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United States of America Patent
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May 13, 2014
Grant Date -
Jan 24, 2013
app pub date -
Mar 25, 2011
filing date -
Mar 29, 2010
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Abstract
Embodiments of the device relate to an injector (11) for injecting a gas in a processing chamber, including an inlet (21) for receiving a gas wave or a gas flow, a flow-shaping section (20) for expanding the gas in a direction (YY′) perpendicular to a propagation axis (XX′) of the gas, and an outlet (22) for expelling the gas. The flow-shaping section has first and second sidewalls (23) which diverge according to a divergence angle (A1) relative to the propagation axis of the gas, and includes means for slowing down the velocity of the gas near the center of the flow-shaping section, relative to the velocity of the gas near at least one sidewall.
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