Magnetron sputter cathode
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United States of America Patent
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May 6, 2014
Grant Date -
Jun 8, 2006
app pub date -
Nov 21, 2005
filing date -
May 23, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier (2) is disposed the sputter target (4) with a backing plate (3), which maintains a gap (14) from the carrier (2). The backing plate (3) is developed as a cooling plate. In it are located cooling means channels (15), which, via an inlet (16) through the carrier (2), are supplied with cooling fluid, which can flow out again via an outlet (17) through the carrier (2). On the atmospheric side is located a magnet configuration (5).
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