Lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 8711330
APP PUB NO 20110211181A1
SERIAL NO

13102620

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Abstract

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In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B VP O BOX 324 VELDHOVEN 5500 AH
CARL ZEISS SMT AGRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baselmans, Johannes Jacobus Matheus Oirschot, NL 163 4062
Engelen, Adrianus Franciscus Petrus Waalre, NL 12 162
Finders, Jozef Maria Veldhoven, NL 60 1059
Graeupner, Paul Aalen, DE 25 651
Mulkens, Johannes Catharinus Hubertus Waalre, NL 213 10886
Streefkerk, Bob Tilburg, NL 201 10575
Van, Schoot Jan Bernard Plechelmus Eindhoven, NL 49 462

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