Composition for photodynamic disinfection

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United States of America Patent

PATENT NO 8703050
APP PUB NO 20100233022A1
SERIAL NO

12603861

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Abstract

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The present invention includes a composition for enhancing the antimicrobial efficacy of photodynamic disinfection against Gram-negative organism that is receptive to paraben potentiation using a composition comprising a photosensitizer and at least one paraben. The present invention also includes a method for photodynamic disinfection comprising applying the composition to a desired treatment area and applying light to the desired treatment area at a wavelength absorbed by the photosensitizer so as to inhibit Gram-negative organism located within the treatment area wherein the Gram-negative organism is receptive to paraben potentiation.

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Patent Owner(s)

Patent OwnerAddress
ONDINE INTERNATIONAL AGC/O CONFIDARIS AG OBERWILER KIRCHWEG 4A 6300 ZUG

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Loebel, Nicolas Woodinville, US 19 264
Pedigo, Lisa Lake Forest Park, US 3 29
Street, Cale Edmonds, US 14 149

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