Device and method for monitoring and adjusting the radial position of an interface layer in a nozzle centrifuge

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8702576
APP PUB NO 20130065744A1
SERIAL NO

13635771

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Device for monitoring and adjusting, in particular for fixing and securing, the radial position of an interface layer in a nozzle centrifuge for separating a light phase having a relatively low density and a heavy phase having a relatively high density from a mixture containing these two liquids and a solid, the nozzle centrifuge including a rotor 1-3 which is rotatable around a rotational axis R and which forms an inlet 9 for said mixture, a separating chamber 7 communicating with said inlet 9 and having a radially inner part 7a and a radially outer part 7b, nozzles 12 at the separating chamber distributed around the rotational axis R for throwing out the heavy phase and the solid, an outlet 13a, 13b, 14 for discharging the light phase, an overflow outlet 19 being radially delimited by a cover or level ring 20 for discharging the heavy phase, and an inlet 9; 25, 26 for supplying additional heavy phase to the centrifuge, characterized in that a sensor 24 is arranged in the flow path of the heavy phase 23 leaving the centrifuge for monitoring the magnitude of the flow and transmitting a corresponding signal such that the supply of additional heavy phase via the inlet 9 or 25, 26 can be adjusted in reply to the signal.

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Patent Owner(s)

Patent OwnerAddress
ALFA LAVAL CORPORATE ABLONGDE SWEDEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Karlsson, Per Hägersten, SE 33 1366

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