Mitigation of plasma-inductor termination
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United States of America Patent
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Apr 15, 2014
Grant Date -
Jul 7, 2011
app pub date -
Oct 13, 2010
filing date -
Jan 5, 2010
priority date (Note) -
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Abstract
In accordance with one embodiment of the present invention, the dielectric discharge chamber of a generally axially symmetric ion source has a hollow cylindrical shape. One end of the discharge chamber is closed with a dielectric wall. The working gas is introduced through an aperture in the center of this wall. The ion-optics grids are at the other end of the discharge chamber, which is left open. The inductor is a helical coil of copper conductor that surrounds the cylindrical portion of the dielectric discharge chamber. The modification that produces uniformity about the axis of symmetry is a shorted turn of the helical-coil inductor at the end of the inductor closest to the ion-optics grids.
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