Debris removal in high aspect structures

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8696818
APP PUB NO 20130037053A1
SERIAL NO

13652114

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Abstract

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A system for removing debris from a surface of a photolithographic mask is provided. The system includes an atomic force microscope with a tip supported by a cantilever. The tip includes a surface and a nanometer-scaled coating disposed thereon. The coating has a surface energy lower than the surface energy of the photolithographic mask.

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Patent Owner(s)

Patent OwnerAddress
BRUKER NANO INC112 ROBIN HILL ROAD SANTA BARBARA CA 93117

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arruza, Bernabe J Boca Raton, US 7 141
Robinson, Tod Evan Boynton Beach, US 13 93
Roessler, Kenneth Gilbert Boca Raton, US 22 244

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