Low irritancy cleansing compositions
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United States of America Patent
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Mar 18, 2014
Grant Date -
Jun 7, 2012
app pub date -
Aug 2, 2010
filing date -
Aug 3, 2009
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Abstract
A low irritancy cleansing composition comprises: (a) an anionic surfactant compound of formula (I): wherein R1 represents a C4-36 substituted or unsubstituted hydrocarbyl group; each of R2, R3, R4 and R5 independently represents a hydrogen atom or a C1-4 alkyl group and wherein at least one of R2, R3, R4 and R5 is not hydrogen and M+ represents a cation; and (b) an amphoteric surfactant; wherein the molar ratio of component (a) to component (b) is from 0.25:1 to 4:1 and wherein the composition comprises less than 3 wt % polyethoxylated non-ionic species.
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