Method and apparatus for substrate-mask alignment
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United States of America Patent
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Mar 18, 2014
Grant Date -
Nov 28, 2013
app pub date -
May 25, 2012
filing date -
May 25, 2012
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Abstract
A shadow masking device for use in the semiconductor industry includes self-aligning mechanical components that permit shadow masks to be exchanged while maintaining precise alignment with the target substrate. The misregistration between any two of the various layers in the formed structure can be kept to less than 40 microns.
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