Surface processing method of silicon substrate for solar cell, and manufacturing method of solar cell
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United States of America Patent
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Mar 18, 2014
Grant Date -
Mar 15, 2012
app pub date -
Dec 20, 2010
filing date -
Sep 10, 2010
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Abstract
Disclosed is a surface processing method of a crystalline silicon substrate for a solar cell, and a method for manufacturing a solar cell. The surface processing method of a substrate for a solar cell comprises first surface processing step for forming a plurality of first protrusions on surfaces of a substrate by etching the crystalline silicon substrate by using an aqueous solution, second surface processing step for forming a plurality of second protrusions smaller than the first protrusions by adhering etching residues onto an upper surface, a light receiving surface among the surfaces of the substrate, by using first etching gas, and residue removing step for removing etching residues adhered onto the upper surface of the substrate having undergone the second surface processing step.
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