Method for producing a thin-film solar cell by use of microcrystalline silicon and a layer sequence
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United States of America Patent
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Mar 4, 2014
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Nov 1, 2011
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Dec 21, 2004
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Abstract
A thin film solar cell is disclosed comprising the following layers deposited on a substrate:
- a microcrystalline p- or n-layer,an intermediate microcrystalline silicon i-layer applied by a hot-wire chemical-vapor deposition (HWCVD) method on the microcrystalline p- or n-layer a),an additional i-layer of microcrystalline silicon, which is formed by depositing on the intermediate microcrystalline silicon i-layer, by a plasma enhanced chemical vapor deposition (PECVD), a sputtering process, or a photo-CVD method whereby layers b) and c) together form an i-layer, andif a p-layer is present as the layer of step a), an n-layer, and if an n-layer is present as the layer of step a), a p-layer that is either microcrystalline or amorphous.
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