Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solvent
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United States of America Patent
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Feb 25, 2014
Grant Date -
Nov 4, 2010
app pub date -
Sep 22, 2009
filing date -
Sep 22, 2008
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Abstract
An improved method for making a photoresist stripping solution for a metal-containing semi-conductor substrate where the stripping solution comprises a blend of at least one organic sulfonic acid with a halogen-free hydrocarbon solvent wherein concentrations of trace amounts of residual sulfuric acid and sulfur trioxide in the blend are reduced to very low levels.
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