Photosensitive composition including photopolymerizable polymer having fluorene skeleton
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United States of America Patent
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Feb 25, 2014
Grant Date -
May 24, 2012
app pub date -
Apr 20, 2010
filing date -
Apr 27, 2009
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Abstract
A material for a planarization film, a spacer, and a microlens that satisfies heat resistance and transparency requirements without impairing a refractive index. A negative photosensitive composition includes a photopolymerizable polymer (A) having a fluorene skeleton, a monomer (B) having a fluorene skeleton and a photopolymerization initiator (C). The photopolymerizable polymer (A) having a fluorene skeleton may include a moiety that is soluble in an alkaline developer solution, or a unit structure of Formula (1):
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