Side gas injector for plasma reaction chamber
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United States of America Patent
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Feb 18, 2014
Grant Date -
Apr 7, 2011
app pub date -
Aug 30, 2010
filing date -
Oct 1, 2009
priority date (Note) -
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Abstract
A side gas injector for a plasma reaction chamber is provided. The side gas injector includes a circular distribution plate and a cover plate. The circular distribution plate includes an injection hole for injecting a reaction gas and a distribution channel part for distributing the reaction gas such that the reaction gas introduced from the injection hole can be radially simultaneously jetted in a plurality of positions along an inner circumference surface of the distribution plate. The cover plate is coupled to a top of the distribution plate and seals a top of the distribution channel part.
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