Photosensitive resin composition, photosensitive dry film and method for forming pattern

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8647807
APP PUB NO 20130004895A1
SERIAL NO

13519495

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Abstract

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A photosensitive resin composition comprising: a vinyl-based polymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group; a vinyl-based polymer (II) obtained by polymerizing a monomer mixture containing a carboxyl group-containing vinyl monomer (b), and having a weight average molecular weight of 20,000 to 100,000, provided that the vinyl-based polymer (I) is excluded; a quinonediazide compound (III); and a compound (IV) represented by following formula (5).

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Patent Owner(s)

Patent OwnerAddress
MICRO PROCESS INC2-119-7 AKAYAMA-CHO KOSHIGAYA-SHI SAITAMA 343-0807

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lan, Wei Jen Taoyuan Hsien, TW 2 0
Lin, Chao Wen Taoyuan Hsien, TW 2 0
Nakagawara, Hidetaka Toyohashi, JP 3 1
Ueda, Akifumi Toyohashi, JP 14 34
Watanabe, Kazuo Koshigaya, JP 253 2964
Watanabe, Shigeki Koshigaya, JP 152 1846

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