Method of forming insulation film using plasma treatment cycles
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United States of America Patent
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Feb 11, 2014
Grant Date -
May 20, 2010
app pub date -
Nov 13, 2009
filing date -
Nov 14, 2008
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Abstract
A film forming cycle based on pulse CVD or ALD is repeated multiple times to form a single layer of insulation film, while a reforming cycle is implemented in the aforementioned process, either once or multiple times per each film forming cycle, by treating the surface of formed film using a treating gas that has been activated by a plasma.
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