Residual layer thickness measurement and correction

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United States of America Patent

PATENT NO 8647554
APP PUB NO 20100286811A1
SERIAL NO

12835009

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Abstract

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In nano-imprint lithography it is important to detect thickness non-uniformity of a residual layer formed on a substrate. Such non-uniformity is compensated such that a uniform residual layer may be formed. Compensation is performed by calculating a corrected fluid drop pattern.

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CITIBANK N A388 GREENWICH STREET NEW YORK NY 10013

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Johnson, Stephen C Austin, US 55 1209
Jones, Christopher Ellis Austin, US 13 105
Khusnatdinov, Niyaz Round Rock, US 65 667
Lad, Pankaj B DeSoto, US 26 898
Schumaker, Philip D Austin, US 34 613

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