Photo-mask and wafer image reconstruction

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United States of America Patent

PATENT NO 8644588
APP PUB NO 20100135568A1
SERIAL NO

12440722

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Abstract

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A system receives a mask pattern and a first image of at least a portion of a photo-mask corresponding to the mask pattern. The system determines a second image of at least the portion of the photo-mask based on the first image and the mask pattern. This second image is characterized by additional spatial frequencies than the first image.

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Patent Owner(s)

Patent OwnerAddress
KLA CORPORATIONONE TECHNOLOGY DRIVE MILPITAS CA 95035

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abrams, Daniel S Palo Alto, US 18 641
Hegyi, Alex N Ann Arbor, US 7 188
Preil, Moshe E Sunnyvale, US 25 1121

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