Optofluidic lithography system, method of manufacturing two-layered microfluid channel, and method of manufacturing three-dimensional microstructures
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United States of America Patent
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Feb 4, 2014
Grant Date -
Jul 11, 2013
app pub date -
Jul 20, 2012
filing date -
Sep 9, 2008
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Abstract
An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.
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