Sub-lithographic diffractive MEMS
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United States of America Patent
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Jan 28, 2014
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N/A
app pub date -
Oct 15, 2010
filing date -
Oct 15, 2009
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Abstract
A diffractive MicroElectroMechanical systems and a method of fabricating the same are provided. In one embodiment, the method comprises: depositing a sacrificial layer onto a substrate; depositing a first structural layer on the sacrificial layer and patterning the structural layer to form a patterned structural layer including plurality of actuators; conformably depositing a sacrificial film on the patterned structural layer; depositing a second structural layer on the sacrificial film; planarizing the second structural layer to expose the sacrificial film and the plurality of actuators; and removing the sacrificial layer and sacrificial film to release the plurality of actuators, each of the plurality of actuators separated from the second structural layer by a thickness of the conformal sacrificial film. Other embodiments are also provided.
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