Methods and devices for high accuracy deposition on a continuously moving substrate
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jan 28, 2014
Grant Date -
N/A
app pub date -
Mar 29, 2010
filing date -
Mar 28, 2009
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method is explained that allows for a via to be filled with a dispensed material while the substrate is in continuous movement. A device is described that allows for a via to be filled while the target substrate is in continuous movement. The device consists of a material jetting system, a machine vision system that can detect the optimum trigger point, an electronic control circuit, a feedback mechanism and a web handling provision.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully