Device for forming a film by deposition from a plasma
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United States of America Patent
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Jan 28, 2014
Grant Date -
Mar 25, 2010
app pub date -
Oct 26, 2007
filing date -
Nov 2, 2006
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Abstract
A plasma excitation device is described for use in depositing a film on a substrate from a plasma formed by distributed electron cyclotron resonance. The device comprises a microwave antenna having an end from which microwaves are emitted, a magnet disposed in the region of the said antenna end and defining therewith an electron cyclotron resonance region in which a plasma can be generated, and a gas entry element having an outlet for a film precursor gas or a plasma gas. The outlet is arranged to direct gas towards a film deposition area situated beyond the magnet, as considered from the microwave antenna.
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