Immersion lithographic apparatus with immersion fluid re-circulating system
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United States of America Patent
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Jan 14, 2014
Grant Date -
Jul 23, 2009
app pub date -
Jan 16, 2009
filing date -
Jan 23, 2008
priority date (Note) -
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Abstract
A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.
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