chamber clean additive
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United States of America Patent
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Jan 7, 2014
Grant Date -
Mar 10, 2011
app pub date -
Sep 9, 2010
filing date -
Sep 10, 2009
priority date (Note) -
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Abstract
Methods of cleaning a processing chamber with nitrogen trifluoride (NF3) are described. The methods involve a concurrent introduction of nitrogen trifluoride and a reactive diluent into the chamber. The NF3 may be excited in a plasma inside the chamber or in a remote plasma region upstream from the chamber. The reactive diluent may be introduced upstream or downstream of the remote plasma such that both NF3 and the reactive diluent (and any plasma-generated effluents) are present in the chamber during cleaning. The presence of the reactive diluent enhances the chamber-cleaning effectiveness of the NF3.
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