Optimized mask design for fabricating periodic and quasi-periodic patterns
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United States of America Patent
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Dec 31, 2013
Grant Date -
Apr 18, 2013
app pub date -
Sep 14, 2010
filing date -
Nov 13, 2009
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Abstract
A method for printing a desired periodic or quasi-periodic pattern of dot features into a photosensitive layer disposed on a substrate including the steps of designing a mask pattern having a periodic or quasi-periodic array of unit cells each having a ring feature, forming a mask with said mask pattern, arranging the mask substantially parallel to the photosensitive layer, arranging the distance of the photosensitive layer from the mask and illuminating the mask according to one of the methods of achromatic Talbot lithography and displacement Talbot lithography, whereby the illumination transmitted by the mask exposes the photosensitive layer to an integrated intensity distribution that prints the desired pattern.
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