Apparatus and method for indirect surface cleaning
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United States of America Patent
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Dec 24, 2013
Grant Date -
Oct 24, 2013
app pub date -
Oct 22, 2012
filing date -
Aug 9, 2007
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Abstract
Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, the surface of a substrate having a contaminating particulate disposed thereon is cleaned by directing a laser towards the substrate, generating a temperature increase in the substrate and transferring thermal energy from the substrate to the particulate to decompose the particulate. The laser has a wavelength that is substantially the same as a local maximum of the substrate absorption spectrum.
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