Technique for repairing a reflective photo-mask
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United States of America Patent
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Dec 17, 2013
Grant Date -
Mar 15, 2012
app pub date -
Feb 9, 2011
filing date -
Sep 14, 2010
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Abstract
During a calculation technique, a modification to a reflective photo-mask is calculated. In particular, using information associated with different types of analysis techniques a group of one or more potential defects in the reflective photo-mask is determined. Then, the modification to the reflective photo-mask is calculated based on at least a subset of the group of potential defects using an inverse optical calculation. In particular, during the inverse optical calculation, a cost function at an image plane in a model of the photolithographic process is used to determine the modification to the reflective photo-mask at an object plane in the model of the photolithographic process.
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