Thin-film absorber formation method
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United States of America Patent
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Dec 10, 2013
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N/A
app pub date -
Oct 6, 2011
filing date -
Oct 6, 2010
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Abstract
A thin-film absorber formation method includes: operating a furnace having an internal atmosphere containing a process gas; loading process gas material into a source container that is part of a system configured to provide process gas to the furnace, wherein loading of the source container occurs without exposing the internal atmosphere of the furnace to external atmosphere present in the source container by solidifying process gas material to form a gas tight seal to separate the source container from the furnace, wherein the seal is formed before the source container is opened for loading and external atmosphere enters the source container, including a pathway configured to retain process gas material in a section of the pathway to solidify and create the seal.
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