Decomposition/elimination method using a photocatalytic material

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United States of America Patent

PATENT NO 8597603
APP PUB NO 20130078174A1
SERIAL NO

13701920

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention provides a new method for decomposing and/or removing hazardous substances using a photocatalytic material. The method of the present invention is sufficiently useful in fields requiring quick decomposition and/or removal of hazardous substances in gas and/or liquid phases. The decomposition method of the present invention using a photocatalytic material enables significantly efficient and rapid decomposition of hazardous substances in gas and/or liquid phases by causing a photocatalytic material to coexist with a dilute hydrogen peroxide solution.

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Patent Owner(s)

Patent OwnerAddress
SHOWA CO LTD2443-1 KITA-TAHARA-CHO IKOMA-CITY NARA 6300142

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Arai, Teruo Ikoma, JP 4 70
Onoda, Kinji Ikoma, JP 8 23
Takayasu, Teruki Ikoma, JP 17 35

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