using the generating system

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United States of America Patent

PATENT NO 8580086
APP PUB NO 20130220793A1
SERIAL NO

13846412

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A high concentration NO2 gas generating system including a circulating path configured by connecting a chamber, a plasma generator, and a circulating means, wherein NO2 is generated by circulating a gas mixture including nitrogen and oxygen in the circulating path is provided. The high concentration NO2 gas generating system provides a high concentration NO2 generating system and the high concentration NO2 generating method using the generating system by which NO2 of high concentration (approximately 500 ppm or above) required for a high level of sterilization process in such as sterilization of medical instruments can be simply and selectively obtained. In addition, since indoor air is used as an ingredient, the management of ingredients is simple and highly safe, and the high concentration of NO2 can be simply and selectively prepared on demand.

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Patent Owner(s)

Patent OwnerAddress
NOXILIZER INC1334 ASHTON ROAD SUITE E HANOVER MD 21076

International Classification(s)

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  • 2013 Application Filing Year
  • C01B Class
  • 1318 Applications Filed
  • 1164 Patents Issued To-Date
  • 88.32 % Issued To-Date
Click to zoom InYear of Issuance% of Matters IssuedCumulative IssuancesYearly Issuances201320142015201620172018201920202021202220230255075100

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hayashi, Hirofumi Wakayama, JP 36 249
Hirose, Tomoyuki Wakayama, JP 28 521
Iwasaki, Ryuichi Wakayama, JP 15 78
Kim, Joongsoo Los Altos, US 12 24
Koo, Jae-Mo Palo Alto, US 11 380
Lee, Sang Hun San Ramon, US 218 1251
Masuda, Shigeru Wakayama, JP 42 297
Matsuuchi, Hidetaka Wakayama, JP 5 34
Mike, Masaaki Wakayama, JP 10 64
Tanibata, Toru Wakayama, JP 29 253
Way, Andrew San Jose, US 8 51
Weihe, Orion Saratoga, US 10 106

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Patent Citation Ranking

  • 2 Citation Count
  • C01B Class
  • 11.67 % this patent is cited more than
  • 12 Age
Citation count rangeNumber of patents cited in rangeNumber of patents cited in various citation count ranges512767323442111101 - 1011 - 2021 - 3031 - 4041 - 5051 - 6061 - 7071 - 8081 - 90100 +020406080100120140160180200220240260280300

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11.5 Year Payment $7400.00 $3700.00 $1850.00 May 12, 2025