Apparatus for agitating and evacuating byproduct dust from a semiconductor processing chamber
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United States of America Patent
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Nov 12, 2013
Grant Date -
Feb 16, 2012
app pub date -
Aug 13, 2010
filing date -
Aug 13, 2010
priority date (Note) -
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Abstract
A system and method for semiconductor processing chamber includes a housing that can cover an annular gap of a pedestal well of the semiconductor processing chamber. A cleaning nozzle is removably coupled to a compressed dry air (CDA) supply. The cleaning nozzle can inject the CDA into the pedestal well while the housing can contain a byproduct dust agitated by the injected CDA. The byproduct dust is evacuated by at least one vacuum port that is removably coupled to a vacuum source.
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