Lithographic apparatus and device manufacturing method
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United States of America Patent
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Oct 29, 2013
Grant Date -
Aug 2, 2012
app pub date -
Apr 13, 2012
filing date -
Oct 15, 2003
priority date (Note) -
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Abstract
An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.
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