Dual storage node memory

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United States of America Patent

PATENT NO 8564042
APP PUB NO 20070205454A1
SERIAL NO

11702845

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Abstract

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An embodiment of the present invention is directed to a memory cell. The memory cell includes a first charge storage element and a second charge storage element, wherein the first and second charge storage elements include nitrides. The memory cell further includes an insulating layer formed between the first and second charge storage elements. The insulating layer provides insulation between the first and second charge storage elements.

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Patent Owner(s)

Patent OwnerAddress
INFINEON TECHNOLOGIES LLC198 CHAMPION COURT SAN JOSE CA 95134

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Chi Saratoga, US 123 2272
Cheung, Fred San Jose, US 13 195
Kinoshita, Hiroyuki San Jose, US 185 2398
Lee, Chungho Sunnyvale, US 39 359
Sun, Yu Saratoga, US 426 3781

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