Method and device for producing stoichiometry gradients and layer systems
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United States of America Patent
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Oct 22, 2013
Grant Date -
Mar 3, 2011
app pub date -
Aug 24, 2010
filing date -
Aug 25, 2009
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Abstract
A process and a device for coating substrates with a stoichiometric gradient in an in-line coating system include at least two evaporation devices, each with an evaporator tube. The evaporator tubes are implemented so as to be tiltable independently of one another, whereby the transition area of the two vapor lobes can be adapted to the requirements of the gradient profile. Furthermore, the spacing of the evaporator tubes from the substrate and each other can be set.
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