Monolithic aluminum alloy target and method of manufacturing
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United States of America Patent
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Oct 8, 2013
Grant Date -
Mar 10, 2011
app pub date -
Jan 6, 2010
filing date -
Jan 22, 2009
priority date (Note) -
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Abstract
Aluminum or aluminum alloy sputter targets and methods of making same are provided. The pure aluminum or aluminum alloy is mechanically worked to produce a circular blank, and then the blank is given a recrystallization anneal to achieve desirable grain size and crystallographic texture. A 10-50% additional strain is provided to the blank step after the annealing to increase the mechanical strength. Further, in a flange area of the target, the strain is greater than in the other target areas with the strain in the flange area being imparted at a rate of about 20-60% strain. The blank is then finished to form a sputtering target with desirable crystallographic texture and adequate mechanical strength.
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