Method for electrochemically depositing carbon nitride films on a substrate

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United States of America Patent

PATENT NO 8545688
APP PUB NO 20110290656A1
SERIAL NO

12789959

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Abstract

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Dense carbon nitride films are electrochemically formed on a conductive substrate by placing the substrate acting as cathode in a molten salt electrolyte bath and applying DC current across the substrate and a counter electrode acting as anode also placed in the molten salt electrolyte bath. Carbonate ion and nitrate ion are concurrently reduced to deposit carbon nitride films on the substrate.

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Patent Owner(s)

Patent OwnerAddress
TOYOTA BOSHOKU KABUSHIKI KAISHAJAPAN
THE DOSHISHAKYOTO 602-8580
I'MSEP CO LTD134 CHUDOJI MINAMI-MACHI SHIMOGYO-KU KYOTO-SHI KYOTO 6008813
SEC CARBON LIMITED6TH FLOOR JRE AMAGASAKI FRONT BLDG 1-2-6 SHIOE AMAGASAKI-SHI HYOGO 6610976

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Amahashi, Hiroaki Fukuchiyama, JP 3 16
Fukasawa, Kazuhito Uji, JP 7 65
Ito, Yasuhiko Kyotanabe, JP 23 167
Kuroda, Kouji Fukuchiyama, JP 12 222
Nishikiori, Tokujiro Kyoto, JP 8 32
Yasuda, Naohiro Yokkaichi, JP 13 65

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