System and method for cleaning a conditioning device
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United States of America Patent
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Oct 1, 2013
Grant Date -
Dec 18, 2008
app pub date -
Oct 19, 2005
filing date -
Oct 19, 2005
priority date (Note) -
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Abstract
A system for cleaning a conditioning device to improve the efficiency of the conditioning of a polishing pad using the conditioning device as part of a chemical-mechanical polishing process, the system comprising a conditioning device; a fluid dispenser arranged to dispense a fluid on the conditioning device; and an acoustic nozzle arranged to emit a megasonic or ultrasonic signal at the conditioning device while the fluid dispenser is dispensing the fluid on the conditioning device.
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