Apparatus and methods for regulating material flow using a temperature-actuated valve
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 1, 2013
Grant Date -
Aug 2, 2012
app pub date -
Feb 2, 2012
filing date -
Feb 2, 2011
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
One embodiment of the present invention is a gas discharge system utilizing a temperature-actuated valve. The temperature-actuated valve uses a temperature-measuring device to sense the temperature of the natural gas after it pass through an expansion valve and after leaving a heat exchanger inside the discharge station. This temperature-measuring device sends a signal to a valve that is automatically actuated. If the temperature of the gas is too low, the valve is tightened, increasing the residence time in the heat exchanger and increasing the gas temperature. If the gas temperature is too high, the valve is opened, reducing the residence time in the heat exchanger, decreasing gas temperature. Using this temperature-actuated valve to control the temperature of a wet gas discharge station is also disclosed.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully