Apparatus comprising substrate and conductive layer
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United States of America Patent
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Sep 3, 2013
Grant Date -
Mar 14, 2013
app pub date -
Sep 15, 2012
filing date -
Jun 20, 2006
priority date (Note) -
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Abstract
A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
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