Method for producing of ultra-clean and high-purity N-methyl pyrrolidone

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United States of America Patent

PATENT NO 8519157
APP PUB NO 20120071670A1
SERIAL NO

12916686

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Abstract

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The present invention provides a method for producing of ultra-clean and high-purity N-methyl pyrrolidone through using industrial grade N-methyl pyrrolidone as raw material. After the pretreatment, sorption and dehydration with 4A molecular sieve, twice membrane filtrations are carried out through using β-cyclodextrin composite membrane for the first and 18-crown-6 composite membrane for the second. The filtrate is rectified under vacuum and filtered through using complexant composite microporous membrane to obtain the product. The ultra-clean and high-purity N-methyl pyrrolidone, produced by the method provided by the present invention, is up to the SEMI C8 standard. And the purity of the product is over 99.8%, the moisture content is less than 0.03%, and the content of single metal ion is less than 1 ppb. Comparing to the prior art, the present invention has the advantage such as the stable quality of the product, simple operation, and is suitable for industrial continuous production.

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Patent Owner(s)

Patent OwnerAddress
SHANGHAI CHEMICAL REAGENT RESEARCH INSTITUTE200333 NO 401 NORTH ROAD SHANGHAI PUTUO DISTRICT SHANGHAI CITY SHANGHAI CITY 200333

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mao, Huiping Putuo Shanghai, CN 1 3
Shen, Zheyu Putuo Shanghai, CN 3 3
Zhan, Jiarong Putuo Shanghai, CN 7 9

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