Optical recording material, optical recording method, photosensitive material and method
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United States of America Patent
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Aug 27, 2013
Grant Date -
Dec 23, 2010
app pub date -
Jan 28, 2009
filing date -
Jan 30, 2008
priority date (Note) -
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Abstract
Provided is a nonlinear optical material, an optical recording material, an optical recording method, a photosensitive material, a photopolymerization initiator, and a photosensitizer. One exemplary aspect of the present invention is a photosensitive material used for photolithography for forming a pattern by irradiating a photoresist with excitation light which includes a donor molecule 11 that is excited by the excitation light, and an acceptor molecule 12 that is excited by energy transfer or charge transfer from the excited donor 11.
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