Cylindrical magnetron
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United States of America Patent
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Aug 6, 2013
Grant Date -
Oct 22, 2009
app pub date -
Apr 9, 2009
filing date -
Apr 14, 2008
priority date (Note) -
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Abstract
A rotatable cylindrical magnetron sputtering device that includes a cathode body defining a magnet receiving chamber and a cylindrical target assembly surrounding the cathode body, wherein the cylindrical target assembly is rotatable around the cathode body. The cylindrical target assembly includes a hollow mandrel and a target portion mounted around and spaced away from the hollow mandrel portion so as to create a space gap between the hollow mandrel and the target portion, wherein the space gap may be greater than 0.002 inch and less than 0.020 inch.
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