Sputter targets and methods of forming same by rotary axial forging

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United States of America Patent

PATENT NO 8500928
APP PUB NO 20120297855A1
SERIAL NO

13551697

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Abstract

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A method of making sputter targets using rotary axial forging is described. Other thermomechanical working steps can be used prior to and/or after the forging step. Sputter targets are further described which can have unique grain size and/or crystal structures.

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Patent Owner(s)

  • GLOBAL ADVANCED METALS, USA, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ford, Robert B Washington Court House, US 31 572
Matera, John P Grove City, US 5 62
Wickersham,, Jr Charles E Columbus, US 8 38

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