Method to form a photovoltaic cell comprising a thin lamina
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United States of America Patent
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Jul 9, 2013
Grant Date -
Aug 6, 2009
app pub date -
Feb 5, 2008
filing date -
Feb 5, 2008
priority date (Note) -
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Abstract
A very thin photovoltaic cell is formed by implanting gas ions below the surface of a donor body such as a semiconductor wafer. Ion implantation defines a cleave plane, and a subsequent step exfoliates a thin lamina from the wafer at the cleave plane. A photovoltaic cell, or all or a portion of the base or emitter of a photovoltaic cell, is formed within the lamina. In preferred embodiments, the wafer is affixed to a receiver before the cleaving step. Electrical contact can be formed to both surfaces of the lamina, or to one surface only.
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